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| Date : 2009/08/19, Hit : 2294 |
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¼¼¹Ì³ª : ¼¼¹Ì³ª°øÁö (8/20)- ºÎ»ê´ë ±Ç¼¼ÈƱ³¼ö Atomic Layer Deposition for nano-fabrication and novel hybrid functional materials |
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S.H.Cho |
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¼¼¹Ì³ª¸í: Atomic Layer Deposition for nano-fabrication and novel hybrid functional materials
ÀϽÃ: 8¿ù 20ÀÏ(¸ñ) ¿ÀÈÄ 4½Ã
Àå¼Ò: ¿¬±¸6µ¿ 1Ãþ ¼¼¹Ì³ª½Ç
°»ç: ±Ç¼¼ÈÆ ±³¼ö ºÎ»ê´ë NCRC
ÃÊ·Ï: Abstract
Currently, atomic layer deposition (ALD) is considered as one of the most promising thin film deposition techniques for nanofabrication. The benefits of ALD include thickness control at the atomic scale, production of highly conformal films, low temperature growth, and wide-area uniformity. Due to these benefits, ALD has been adopted as a key technology for the semiconductor microelectronics industry to break beyond 45nm device node and is now finding ever more emerging applications. In addition, recent efforts revealed that the novel hybrid functional materials can be developed by careful control of ALD process.
In this presentation, we will discuss our results and emerging application areas where ALD has been recently utilized. Examples include the development of novel hybrid functional materials for high-k dielectrics, diffusion barrier, and high efficiency heating resistors. Also, hybrid nanofabrication techniques using ALD combined with low dimensional nanomaterials and biomaterials will be discussed.
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Sung-Hak CHO Ph.D. / Principal Research Engineer
Nano Machining Lab.
KIMM (Korea Institute of Machinery & Materials)
171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
Tel: +82-42-868-7077, Fax: +82-42-868-7149
E.mail: shcho@kimm.re.kr, H.P: 011-9839-3894
Lab URL: http://nanoprocess.kimm.re.kr/femto
KAIST ±â°è°øÇаú °âÀÓ±³¼ö, ºÎ»ê´ë NCRC °âÀÓ±³¼ö
ìíÜâ ìµûùùÊæÚϼá¶(RIKEN) Laser Tech. Lab.ËÔê¬æÚϼê¬
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